A technique is presented using both Michelson and Fabry-Perot interferometry to independently measure the refractive index and the material thickness of semiconductor wafers. The method does not require accurate prior knowledge of either quantity.



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This paper was published in 88th Optical Society of America Annual Meeting Proceedings: Rochester, NY and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.osa.org/. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

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