Published in 88th Optical Society of America Annual Meeting Proceedings: Rochester, NY, October 1, 2004, pages 1-2.
NOTE: At the time of publication, the author Glen Gillen was not yet affiliated with Cal Poly.
A technique is presented using both Michelson and Fabry-Perot interferometry to independently measure the refractive index and the material thickness of semiconductor wafers. The method does not require accurate prior knowledge of either quantity.
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