College - Author 1
College of Engineering
Department - Author 1
Materials Engineering Department
Degree Name - Author 1
BS in Materials Engineering
College - Author 2
College of Engineering
Department - Author 2
Materials Engineering Department
Degree - Author 2
BS in Materials Engineering
Date
6-2025
Primary Advisor
Jean Lee, College of Engineering, Materials Engineering Department
Abstract/Summary
he process of photolithography is critical to the creation of semiconductor devices such as computer chips and solar cells. Precise placement of dopant atoms and metal lines within a semiconducting material is required to produce these devices. The patterning of photoresist that is created by exposure to UV light during photolithography serves as a mask that allows dopant atoms and metal lines to be placed in specific regions of the semiconductor substrate. When properly located, the metal lines and doped regions of the semiconductor combine to form devices such as p-n junctions. The p-n junctions serve as building blocks for integrated circuits used daily by billions of people worldwide.
URL: https://digitalcommons.calpoly.edu/matesp/284