Published in SPIE Plasma Processing, Volume 1594, January 1, 1992, pages 388-400.
NOTE: At the time of publication, the author Richard Savage was not yet affiliated with Cal Poly.
The definitive version is available at https://doi.org/10.1117/12.56652.
This paper discusses and shows applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation is presented. Optical emission spectroscopy techniques discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control, and sputter/deposition plasma monitoring.
Materials Science and Engineering
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