Abstract

A technique is presented using both Michelson and Fabry-Perot interferometry to independently measure the refractive index and the material thickness of semiconductor wafers. The method does not require accurate prior knowledge of either quantity.

Disciplines

Physics

Publisher statement

This paper was published in 88th Optical Society of America Annual Meeting Proceedings: Rochester, NY and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.osa.org/. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.

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URL: http://digitalcommons.calpoly.edu/phy_fac/256