Published in SPIE Plasma Processing, Volume 1594, January 1, 1992, pages 388-400.
Copyright © 1991 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited. This paper is also available at http://dx.doi.org/10.1117/12.56652.
NOTE: At the time of publication, the author Richard Savage was not yet affiliated with Cal Poly.
This paper discusses and shows applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation is presented. Optical emission spectroscopy techniques discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control, and sputter/deposition plasma monitoring.
Materials Science and Engineering